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dc.contributor.authorWang, V. S.
dc.contributor.authorMatyi, R. J.
dc.contributor.authorNordheden, Karen J.
dc.date.accessioned2015-11-16T16:38:44Z
dc.date.available2015-11-16T16:38:44Z
dc.date.issued1994
dc.identifier.citationWang, V. S., R. J. Matyi, and K. J. Nordheden. "Triple-crystal X-ray Diffraction Analysis of Reactive Ion Etched Gallium Arsenide." J. Appl. Phys. Journal of Applied Physics 75.8 (1994): 3835. http://dx.doi.org/10.1063/1.356062en_US
dc.identifier.urihttp://hdl.handle.net/1808/18922
dc.descriptionThis is the published version. Copyright 1994 American Institute of Physicsen_US
dc.description.abstractThe effect of BCl3 reactive ion etching on the structural perfection of GaAs has been studied with diffuse x‐ray scattering measurementsconducted by high‐resolution triple‐crystal x‐ray diffraction. While using a symmetric 004 diffraction geometry revealed no discernible differences between etched and unetched samples, using the more surface‐sensitive and highly asymmetric 113 reflection revealed that the reactive ion etched samples etched displayed less diffusely scattered intensity than unetched samples, indicating a higher level of structural perfection. Increasing the reaction ion etch bias voltage was found to result in decreased diffuse scattering initially, until an apparent threshold voltage was reached, after which no further structural improvement was observed. Furthermore, we have shown that this reduction in process‐induced surfacestructural damage is not due merely to the removal of residual chemical‐mechanical polishing damage.en_US
dc.publisherAmerican Institute of Physicsen_US
dc.subjectEtchingen_US
dc.subjectIon scatteringen_US
dc.subjectSurface structureen_US
dc.subjectIonic conductionen_US
dc.subjectPolishingen_US
dc.titleTriple‐crystal x‐ray diffraction analysis of reactive ion etched gallium arsenideen_US
dc.typeArticle
kusw.kuauthorNordheden, Karen J.
kusw.kudepartmentChemical & Petroleum Engren_US
dc.identifier.doi10.1063/1.356062
kusw.oaversionScholarly/refereed, publisher version
kusw.oapolicyThis item does not meet KU Open Access policy criteria.
dc.rights.accessrightsopenAccess


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