dc.contributor.author | Xu, F. | |
dc.contributor.author | Das, Susobhan | |
dc.contributor.author | Gong, Youpin | |
dc.contributor.author | Liu, Qingfeng | |
dc.contributor.author | Chien, H.-C. | |
dc.contributor.author | Chiu, H.-Y. | |
dc.contributor.author | Wu, J. | |
dc.contributor.author | Hui, Rongqing | |
dc.date.accessioned | 2015-10-19T14:21:03Z | |
dc.date.available | 2015-10-19T14:21:03Z | |
dc.date.issued | 2015 | |
dc.identifier.citation | Xu, F., S. Das, Y. Gong, Q. Liu, H.-C. Chien, H.-Y. Chiu, J. Wu, and R. Hui. "Complex Refractive Index Tunability of Graphene at 1550 Nm Wavelength." Appl. Phys. Lett. Applied Physics Letters 106.3 (2015): 031109. http://dx.doi.org/10.1063/1.4906349 | en_US |
dc.identifier.uri | http://hdl.handle.net/1808/18702 | |
dc.description | This is the published version. Copyright 2015 American Institute of Physics | en_US |
dc.description.abstract | The complex refractive index of graphene fabricated using chemical vapor deposition is characterized at 1550 nm wavelength through the reflectivity measurement on a SiO2/Si substrate. The observed tunability of the complex reflective index as the function of gate electric voltage is in agreement with the prediction based on the Kubo formula. | en_US |
dc.publisher | American Institute of Physics | en_US |
dc.subject | Graphene | en_US |
dc.subject | Reflectivity | en_US |
dc.subject | Electric measurements | en_US |
dc.subject | Refractive index | en_US |
dc.subject | Chemical potential | en_US |
dc.title | Complex refractive index tunability of graphene at 1550 nm wavelength | en_US |
dc.type | Article | |
kusw.kuauthor | Hui, Rongqing | |
kusw.kudepartment | Electrical Engr & Comp Science | en_US |
dc.identifier.doi | 10.1063/1.4906349 | |
kusw.oaversion | Scholarly/refereed, publisher version | |
kusw.oapolicy | This item meets KU Open Access policy criteria. | |
dc.rights.accessrights | openAccess | |