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dc.contributor.authorXu, F.
dc.contributor.authorDas, Susobhan
dc.contributor.authorGong, Youpin
dc.contributor.authorLiu, Qingfeng
dc.contributor.authorChien, H.-C.
dc.contributor.authorChiu, H.-Y.
dc.contributor.authorWu, J.
dc.contributor.authorHui, Rongqing
dc.date.accessioned2015-10-19T14:21:03Z
dc.date.available2015-10-19T14:21:03Z
dc.date.issued2015
dc.identifier.citationXu, F., S. Das, Y. Gong, Q. Liu, H.-C. Chien, H.-Y. Chiu, J. Wu, and R. Hui. "Complex Refractive Index Tunability of Graphene at 1550 Nm Wavelength." Appl. Phys. Lett. Applied Physics Letters 106.3 (2015): 031109. http://dx.doi.org/10.1063/1.4906349en_US
dc.identifier.urihttp://hdl.handle.net/1808/18702
dc.descriptionThis is the published version. Copyright 2015 American Institute of Physicsen_US
dc.description.abstractThe complex refractive index of graphene fabricated using chemical vapor deposition is characterized at 1550 nm wavelength through the reflectivity measurement on a SiO2/Si substrate. The observed tunability of the complex reflective index as the function of gate electric voltage is in agreement with the prediction based on the Kubo formula.en_US
dc.publisherAmerican Institute of Physicsen_US
dc.subjectGrapheneen_US
dc.subjectReflectivityen_US
dc.subjectElectric measurementsen_US
dc.subjectRefractive indexen_US
dc.subjectChemical potentialen_US
dc.titleComplex refractive index tunability of graphene at 1550 nm wavelengthen_US
dc.typeArticle
kusw.kuauthorHui, Rongqing
kusw.kudepartmentElectrical Engr & Comp Scienceen_US
dc.identifier.doi10.1063/1.4906349
kusw.oaversionScholarly/refereed, publisher version
kusw.oapolicyThis item meets KU Open Access policy criteria.
dc.rights.accessrightsopenAccess


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