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    Mass spectrometric characterization of BCl3/SF6 plasmas

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    Lee_mass_spectrometric2000.pdf (391.3Kb)
    Issue Date
    2000
    Author
    Lee, Y. -S.
    Sia, Joanne F.
    Nordheden, Karen J.
    Publisher
    American Institute of Physics
    Type
    Article
    Article Version
    Scholarly/refereed, publisher version
    Metadata
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    Abstract
    Significant increases in the etch rates of both GaAs and GaN have been observed with the addition of SF6 to BCl3plasmas. Mass spectrometric characterization of neutrals in these gas mixtures shows that increasing the SF6 percentage in the flow enhances the dissociation of BCl3, resulting in nearly 100% dissociation at 70% SF6. This increased dissociation is believed to be due to electron attachment heating. Both Cl and Cl2 mass intensities also maximize at 70% SF6. The detection of BClF and BCl2F suggest the possibility of reactions occurring between BCl and BCl2 radicals and fluorine, which may inhibit the recombination of Cl.
    Description
    This is the published version. Copyright © 2000 American Institute of Physics
    URI
    http://hdl.handle.net/1808/18921
    DOI
    https://doi.org/10.1063/1.1309036
    Collections
    • Chemical & Petroleum Engineering Scholarly Works [173]
    Citation
    Lee, Y.-S., J. F. Sia, and K. J. Nordheden. "Mass Spectrometric Characterization of BCl[sub 3]/SF[sub 6] Plasmas." J. Appl. Phys. Journal of Applied Physics 88.8 (2000): 4507. http://dx.doi.org/10.1063/1.1309036

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    Contact KU ScholarWorks
    785-864-8983
    KU Libraries
    1425 Jayhawk Blvd
    Lawrence, KS 66045
    785-864-8983

    KU Libraries
    1425 Jayhawk Blvd
    Lawrence, KS 66045
    Image Credits
     

     

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