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dc.contributor.authorHui, Rongqing
dc.contributor.authorXie, Ruxin
dc.contributor.authorFeng, I. W.
dc.contributor.authorSun, Z. Y.
dc.contributor.authorLin, J. Y.
dc.contributor.authorJiang, Hongxing
dc.date.accessioned2015-10-20T14:52:51Z
dc.date.available2015-10-20T14:52:51Z
dc.date.issued2014-08-04
dc.identifier.citationHui, R., R. Xie, I.-W. Feng, Z. Y. Sun, J. Y. Lin, and H. X. Jiang. "Excitation Cross Section of Erbium-doped GaN Waveguides under 980 Nm Optical Pumping." Appl. Phys. Lett. Applied Physics Letters 105.5 (2014): 051106. http://dx.doi.org/10.1063/1.4892427en_US
dc.identifier.urihttp://hdl.handle.net/1808/18709
dc.descriptionThis is the published version. Copyright 2015 American Institute of Physicsen_US
dc.description.abstractExcitation cross section of erbium-doped GaN waveguides is measured to be approximately 2.2×10−21cm2 at 980 nm pumping wavelength. This cross section value is found relatively insensitive to the crystalline quality of epilayers. However, spontaneous emission carrier lifetimes in these waveguides are directly related to both the crystalline quality and the optical loss, and thus can be used as a material quality indicator.en_US
dc.publisherAmerican Institute of Physicsen_US
dc.subjectFiber waveguidesen_US
dc.subjectCarrier lifetimesen_US
dc.subjectIII-V semiconductorsen_US
dc.subjectErbiumen_US
dc.subjectPhotonic crystal waveguidesen_US
dc.titleExcitation cross section of erbium-doped GaN waveguides under 980 nm optical pumpingen_US
dc.typeArticle
kusw.kuauthorHui, Rongqing
kusw.kudepartmentElectrical Engr & Comp Scienceen_US
dc.identifier.doi10.1063/1.4892427
kusw.oaversionScholarly/refereed, publisher version
kusw.oapolicyThis item meets KU Open Access policy criteria.
dc.rights.accessrightsopenAccess


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